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A Method For Controlling A Critical Dimension (Cd) In An Etch Process - EP1480085B1
EP1480085
- Application Number
- EP04102245A
- Filing Date
- May 21, 2004
- Status
- No Opposition Filed Within Time Limit
- Nov 30, 2018
- Grant Date
- Jan 24, 2018
- External Links
- Slate, Register, Google Patents
Bibliography
The patent EP1480085B1 was granted to Texas Instruments Incorporated on Jan 24, 2018 following the initial filing on May 21, 2004 under the application number EP04102245A . The current legal status of the patent is No Opposition Filed Within Time Limit.
Patent Summary
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Dossier Documents
The dossier documents provide a comprehensive record of the patent’s prosecution history, including filings, correspondence, and decisions made by patent offices. These documents are crucial for understanding the patent’s legal journey and any challenges it may have faced during examination. It also includes the oppositions documents filed against the patent.
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