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Method And Device For Multi-Cathode-Pvd-Coating And Substrate Having Pvd-Coating - EP1908091

The patent EP1908091 was granted to Systec System UND Anlagentechnik on Feb 12, 2020. The application was originally filed on Jul 11, 2006 under application number EP06762519A. The patent is currently recorded with a legal status of "Revoked".

EP1908091

SYSTEC SYSTEM UND ANLAGENTECHNIK
Application Number
EP06762519A
Filing Date
Jul 11, 2006
Status
Revoked
Aug 19, 2022
Grant Date
Feb 12, 2020
External Links
Slate, Register, Google Patents

Patent Summary

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Patent Family

Patent Oppositions (2)

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CEMECONNov 11, 2020KALKOFF & PARTNER PATENTANWALTE MBBADMISSIBLE
IHI HAUZER TECHNO COATINGNov 11, 2020MANITZ FINSTERWALD PATENT UND RECHTSANWALTSPARTNERSCHAFT MBBADMISSIBLE

Patent Citations (18) New

Patent citations refer to prior patents cited during different phases such as opposition or international search.

Citation PhasePublication NumberPublication Link
INTERNATIONAL-SEARCH-REPORTDE19547305
INTERNATIONAL-SEARCH-REPORTEP1260603
INTERNATIONAL-SEARCH-REPORTUS2005109607
INTERNATIONAL-SEARCH-REPORTWO2004031435
INTERNATIONAL-SEARCH-REPORTWO9840532
OPPOSITIONDE102005033769
OPPOSITIONDE19547305
OPPOSITIONEP0521045
OPPOSITIONEP1260603
OPPOSITIONUS2005109607
OPPOSITIONUS5306407
OPPOSITIONWO2004031435
OPPOSITIONWO2004087994
OPPOSITIONWO2006114610
OPPOSITIONWO9100374
OPPOSITIONWO9840532
OTHERDE102005033769
OTHEREP1260603

Non-Patent Literature (NPL) Citations (26) New

NPL citations refer to non-patent references such as research papers, articles, or other publications cited during examination or opposition phases.

Citation PhaseReference TextLink
EXAMINATION- MÜNZ W-D, "Large-Scale Manufacturing of Nanoscale Multilayered Hard Coatings Deposited by Cathodic Arc/Unbalanced Magnetron Sputtering", MRS BULLETIN, PITTSBURGH, US, (20030301), vol. 28, no. 3, pages 173 - 179, XP002301638-
EXAMINATION- PAULITSCH J ET AL, "Structure and mechanical properties of CrN/TiN multilayer coatings prepared by a combined HIPIMS/UBMS deposition technique", THIN SOLID FILMS, ELSEVIER-SEQUOIA S.A. LAUSANNE, CH, vol. 517, no. 3, doi:10.1016/J.TSF.2008.06.080, ISSN 0040-6090, (20081201), pages 1239 - 1244, (20080628), XP025712317
EXAMINATION- EHIASARIAN A P ET AL, "High power pulsed magnetron sputtered CrNx films", SURFACE AND COATINGS TECHNOLOGY, ELSEVIER BV, AMSTERDAM, NL, (20030101), vol. 163-164, doi:10.1016/S0257-8972(02)00479-6, ISSN 0257-8972, pages 267 - 272, XP002445020
INTERNATIONAL-SEARCH-REPORT- YAMAMOTO ET AL, "Properties of nano-multilayered hard coatings deposited by a new hybrid coating process: Combined cathodic arc and unbalanced magnetron sputtering", SURFACE AND COATINGS TECHNOLOGY, ELSEVIER, AMSTERDAM, NL, (20051001), vol. 200, no. 1-4, ISSN 0257-8972, pages 435 - 439, XP005063547 [YP] 1-33 * page 435, column R, paragraph L - page 436, column L, paragraph 3 *
INTERNATIONAL-SEARCH-REPORT- EHIASARIAN A P ET AL, "Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique", PREPARATION AND CHARACTERIZATION, ELSEVIER SEQUOIA, NL, (20040615), vol. 457, no. 2, ISSN 0040-6090, pages 270 - 277, XP004507225 [A] 1-33 * page 270, column L, paragraph 1 - page 271, column R, paragraph 2 * * page 274, column L, paragraph 1 *
OPPOSITION- A. EHIASARIAN, "CrN deposition by reactive high power density pulsed magnetron sputtering", 45th Annual Technical Conference Proceedings, (20020000), ISSN 0737-5921, pages 328 - 334, XP055753134-
OPPOSITION- A.P. EHIASARIAN et al., "Industrial Size High Power Impulse Magnetron Sputtering", 47th Annual Technical Conference, (20040400), ISSN 0737-5921, pages 486 - 490, XP055753131-
OPPOSITION- EHIASARIAN et al., "Industrial Size High Power Impulse Magnetron Sputtering", 47th Annual Technical Conference Proceedings, Dallas, TX USA, (20040424), pages 486 - 490, XP055753131-
OPPOSITION- J.A. DAVIS et al., "High Power Pulse Reactive Sputtering of TiO2", 47th Annual Technical Conference Proceedings, Dal- las, TX USA, (200404), ISSN 0737-5921, pages 215 - 218, XP055753142-
OPPOSITION- MÜNZ W-D, "Large-Scale Manufacturing of Nanoscale Multilayered Hard Coatings Deposited by Cathodic Arc/Unbalanced Magnetron Sputtering", MRS BULLETIN, PITTSBURGH, US, (20030301), vol. 28, no. 3, pages 173 - 179, XP002301638-
OPPOSITION- NEIDHARDT, J., "Comparison of structure and properties of various carbon-enriched TiN, TiAIN based coating systems", Diplomarbeit Westsächsische Hochschule Zwickau, (20001109), XP055753145-
OPPOSITION- W. D. MÜNZ et al., "Source combinee, arc cathodique et magnetron desequilibre pour le depöt de couche minces (Arc Bond Sputtering: ABS", LE VIDE, (20000000), pages 205 - 223, XP008049318-
OPPOSITION- W.-D. MÜNZ, "Large-Scale Manufacturing of Nanoscale Multilayered Hard Coatings Deposited by Cathodic Arc/Unbalanced Magnetron Sputtering", MRS Bulletin, (20030300), pages 173 - 179, XP002301638-
OPPOSITION- W.D. SPROUL et al., "The Reactive Sputter Deposition of Aluminum Oxide Coatings Using High Power Pulsed Magnetron Sputtering (HPPMS", 47th Annual Technical Conference Proceedings, Dallas, TX USA, (20040424), ISSN 0737-5921, pages 96 - 100, XP002452058-
OPPOSITION- T. HURKMANS et al., "Multilayered titanium tungsten nitride coatings with a superlattice structure grown by unbalanced magnetron sputtering", Surface and Coatings Technology, (19950000), vol. 76-77, doi:10.1016/02578-9729(50)25960, pages 159 - 166, XP008127758
OPPOSITION- YAMAMOTO et al., "Properties of nano-multilayered hard coatings de- posited by a new hybrid coating process: Combined cathodic arc and un- balanced magnetron sputtering", SURFACE AND COATINGS TECHNOLOGY, AMSTERDAM, NL, (20051001), vol. 200, no. 1-4, ISSN 0257-8972, pages 435 - 439, XP005063547
OPPOSITION- A.P. EHIASARIAN et al., "Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique", Thin Solid Films, (20040000), vol. 457, doi:10.1016/j.tsf.2003.11.113, pages 270 - 277, XP004507225
OPPOSITION- EHIASARIAN A P et al., "Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique", Thin Solid Films, (20040615), vol. 457, ISSN 0040-6090, pages 270 - 277, XP004507225
OPPOSITION- EHIASARIAN et al., "Influence of high power densities on the composition of pulsed magnetron plasmas", VACUUM, (20020000), vol. 65, doi:10.1016/S0042-207X(01)00475-4, pages 147 - 154, XP001189721
OPPOSITION- EHIASARIAN A P et al., "High power pulsed magnetron sputtered CrNx films", SURFACE AND COATINGS TECHNOLOGY, AMSTERDAM, (2003), vol. 163-164, pages 267 - 272, XP002445020
OPPOSITION- DONOHUE et al., "Large scale fabrication of hard superlattice thin films by combined steered arc evaporation and unbalanced magnetron sputtering", Surface and Coatings Technology, (19970000), vol. 93, pages 69 - 87, XP055698937
OPPOSITION- L.A. DONOHUE et al., "Large-scale fabrication of hard superlattice thin films by combined steered arc evaporation and unbalanced magnetron sputtering", Surface and Coatings Technology, (19970000), vol. 93, doi:10.1016/S0257-8972(97)00028-5, pages 69 - 87, XP055698937
OPPOSITION- W.D. MÜNZ et al., "Industrial scale manufactured superlattice hard PVD coatings", Surface Engineering, (20010000), vol. 17, doi:10.1179/026708401101517557, pages 15 - 27, XP008104721
OPPOSITION- W.D. MÜNZ et al., "Industrial scale manufactured superlattice hard PVD coatings", Surface Engineering, (20010000), vol. 17, no. 1, doi:10.1179/026708401101517557, pages 15 - 27, XP008104721
OTHER- W.-D. MÜNZ, "Large-Scale Manufacturing of Nanoscale Multilayered Hard Coatings Deposited by Cathodic Arc/Unbalanced Magnetron Sputtering", mrs bulletin, (20080300), pages 173 - 179, XP002301638-
OTHER- EHIASARIAN A.P. et al., "High Power pulsed magnetron sputtered CrNx films", Surface and Coatings Technology, (20030000), vol. 163-164, pages 267 - 272, XP002445020

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