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Plating Solution For Electroless Deposition Of Copper - EP2016207B1

EP2016207

LAM RESEARCH
Application Number
EP07762101A
Filing Date
May 10, 2007
Status
No Opposition Filed Within Time Limit
Nov 16, 2018
Grant Date
Jan 10, 2018
External Links
Slate, Register, Google Patents

Bibliography

The patent EP2016207B1 was granted to LAM Research on Jan 10, 2018 following the initial filing on May 10, 2007 under the application number EP07762101A . The current legal status of the patent is No Opposition Filed Within Time Limit.

Patent Summary

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Dossier Documents

The dossier documents provide a comprehensive record of the patent’s prosecution history, including filings, correspondence, and decisions made by patent offices. These documents are crucial for understanding the patent’s legal journey and any challenges it may have faced during examination. It also includes the oppositions documents filed against the patent.

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