Plasma Arc Torch Providing Angular Shield Flow Injection - EP2384097

The patent EP2384097 was granted to Hypertherm on Jun 27, 2018. The application was originally filed on Apr 19, 2006 under application number EP11170259A. The patent is currently recorded with a legal status of "Revoked".

EP2384097

HYPERTHERM
Application Number
EP11170259A
Filing Date
Apr 19, 2006
Status
Revoked
Apr 22, 2022
Grant Date
Jun 27, 2018
External Links
Slate, Register, Google Patents

Patent Summary

Patent Family

Patent Family

Patent Oppositions

Patent oppositions filed by competitors challenge the validity of a granted patent. These oppositions are typically based on claims of prior art, lack of novelty, or non-obviousness. They are a key part of the process for determining a patent's strength and enforceability.

CompanyOpposition DateRepresentativeOpposition Status

Get instant alerts for new oppositions and patent status changes

KJELLBERG FINSTERWALDE PLASMA UND MASCHINENMar 26, 2019MANASSE -

Patent Citations (17) New

Patent citations refer to prior patents cited during different phases such as opposition or international search.

Citation PhasePublication NumberPublication Link
DESCRIPTIONUS6207923
OPPOSITIONDD282349
OPPOSITIONEP0585977
OPPOSITIONEP1324644
OPPOSITIONEP1524887
OPPOSITIONEP1878324
OPPOSITIONUS2001007320
OPPOSITIONUS4590354
OPPOSITIONUS4954688
OPPOSITIONUS5591356
OPPOSITIONUS5591357
OPPOSITIONUS5653895
OPPOSITIONUS5886315
OPPOSITIONUS6207923
SEARCHUS5591356
SEARCHUS5653895
SEARCHUS6207923

Non-Patent Literature (NPL) Citations (4) New

NPL citations refer to non-patent references such as research papers, articles, or other publications cited during examination or opposition phases.

Citation PhaseReference TextLink
OPPOSITION- Anonym, "Bedienungsanleitung Plasmamarkiersystem Fine Marker Artikel nr. 11.032.602", Kjellberg Finsterwalde the Fine Focus company, (20021029), pages 1 - 41, XP055580637-
OPPOSITION- Anonym, "Fine Focus", Plasma-Feinstrahltechnik - die Kunst des Plasmaschneidens-
OPPOSITION- anonym, "Hi Focus .. Plasmaschneiden ein neues Qualitätsniveau in der Fertigung", Kjellberg Finsterwalde-
OPPOSITION- "PA-S75 CNC/TWIN", Kjellberg Finsterwalde, page 5pp-

Download Citation Report

Get a free citation report including examiner, opposition, and international search citations.

Get Citation Report

Dossier Documents

The dossier documents provide a comprehensive record of the patent’s prosecution history - including filings, correspondence, and decisions made by patent offices - and are crucial for understanding the patent’s legal journey and any challenges it may have faced during examination.

  • Date

    Description

  • Get instant alerts for new documents