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Measurement Of The Position Of A Radiation Beam Spot In Lithography - EP2691811B1
EP2691811
- Application Number
- EP12708271A
- Filing Date
- Feb 22, 2012
- Status
- No Opposition Filed Within Time Limit
- Dec 7, 2018
- Grant Date
- Jan 31, 2018
- External Links
- Slate, Register, Google Patents
- Similar Patents facing opposition
Bibliography
The patent EP2691811B1 was granted to Asml Netherlands on Jan 31, 2018 following the initial filing on Feb 22, 2012 under the application number EP12708271A . The current legal status of the patent is No Opposition Filed Within Time Limit.
Patent Summary
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Dossier Documents
The dossier documents provide a comprehensive record of the patent’s prosecution history, including filings, correspondence, and decisions made by patent offices. These documents are crucial for understanding the patent’s legal journey and any challenges it may have faced during examination. It also includes the oppositions documents filed against the patent.
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