Measurement Of The Position Of A Radiation Beam Spot In Lithography - EP2691811
The patent EP2691811 was granted to Asml Netherlands on Jan 31, 2018. The application was originally filed on Feb 22, 2012 under application number EP12708271A. The patent is currently recorded with a legal status of "No Opposition Filed Within Time Limit".
EP2691811
- Application Number
- EP12708271A
- Filing Date
- Feb 22, 2012
- Status
- No Opposition Filed Within Time Limit
- Dec 7, 2018
- Grant Date
- Jan 31, 2018
- External Links
- Slate, Register, Google Patents
Patent Summary
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Dossier Documents
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