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Closed Loop Control - EP2785892

The patent EP2785892 was granted to Applied Materials on Sep 27, 2017. The application was originally filed on Nov 30, 2011 under application number EP11796945A. The patent is currently recorded with a legal status of "Revoked".

EP2785892

APPLIED MATERIALS
Application Number
EP11796945A
Filing Date
Nov 30, 2011
Status
Revoked
Jul 10, 2020
Grant Date
Sep 27, 2017
External Links
Slate, Register, Google Patents

Patent Summary

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VON ARDENNEJun 27, 2018VIERING -

Patent Citations (13) New

Patent citations refer to prior patents cited during different phases such as opposition or international search.

Citation PhasePublication Number
DESCRIPTIONEP20040003574
DESCRIPTIONEP1561837
INTERNATIONAL-SEARCH-REPORTEP1553206
INTERNATIONAL-SEARCH-REPORTUS4201645
INTERNATIONAL-SEARCH-REPORTUS5556520
OPPOSITIONDE102009053756
OPPOSITIONDE4106513
OPPOSITIONEP1553206
OPPOSITIONGB2021294
OPPOSITIONUS4201645
OPPOSITIONUS5556520
OPPOSITIONUS6106676
OPPOSITIONWO0028104

Non-Patent Literature (NPL) Citations (9) New

NPL citations refer to non-patent references such as research papers, articles, or other publications cited during examination or opposition phases.

Citation PhaseReference Text
OPPOSITION- BELLIDO-GONZĂ„LEZ et al., "Flexible Gas Control for Reactive Magnetron Sputtering Process", Proceedings of AIMCAL, Charleston USA, (20041000), pages 1 - 8, XP055510529
OPPOSITION- GRUBER C. et al., "Voltage Control for Reactive Sputtering: Improving Typical Sputter Rate while Dramatically Reducing Input Power Requirements", 52nd Annual Technical Conference Proceedings, Santa Clara, CA, (20090509), ISSN 0737-5921, pages 153 - 157, XP055510512
OPPOSITION- KAZUSS J. et al., "Control of Reactive Deposition Process by Stabilization of the Power Supply Work", 54th Annual Technical Conference Proceedings, Chicago, IL, (20110416), ISSN 0737-5921, pages 419 - 422, XP055510500
OPPOSITION- KON et al., "Impedance Control of Reactive Sputtering Process in Mid-Frequency Mode with Dual Cathodes to Deposit Al-Doped ZnO Films", Japanese Journal of Applied Physics, (20030100), vol. 42, no. 1, pages 263 - 269, XP055510539
OPPOSITION- LINSS et al., "ZnO:Al for CIGS Solar Modules Deposited by Reactive Sputtering from Rotatable Magnetron", 54th Annual Technical Conference Proceedings, Chicago, IL, (20110416), ISSN 0737-5921, pages 508 - 513, XP055510525
OPPOSITION- "Operating instructions TruPlasma MF 7025 - 7100 (A 05- 0124-00.BEN-001-08)", Trumpf, (20090505), pages 1 - 174, XP055510541
OPPOSITION- KOSKI K. et al., "Voltage controlled reactive sputtering process for aluminium oxide thin films", Thin Solid Films, (19980804), vol. 326, no. 1-2, pages 189 - 193, XP004141482
OPPOSITION- RUSKE et al., "Properties of Sn02 films prepared by DC and MF reactive sputtering", Thin Solid Films, (19990000), vol. 351, no. 1-2, pages 146 - 150, XP085016917
OPPOSITION- MAY et al., "ITO coating by reactive magnetron sputtering- comparison of properties from DC and MF processing", Thin Solid Films, (19990830), vol. 351, no. 1, pages 48 - 52, XP085016937

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