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Compound, Material For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, And Pattern Formation Method - EP2955577B1
EP2955577
- Application Number
- EP14749602A
- Filing Date
- Feb 4, 2014
- Status
- No Opposition Filed Within Time Limit
- Dec 7, 2018
- Grant Date
- Jan 31, 2018
- External Links
- Slate, Register, Google Patents
- Similar Patents facing opposition
Bibliography
The patent EP2955577B1 was granted to Mitsubishi GAS Chemical on Jan 31, 2018 following the initial filing on Feb 4, 2014 under the application number EP14749602A . The current legal status of the patent is No Opposition Filed Within Time Limit.
Patent Summary
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Dossier Documents
The dossier documents provide a comprehensive record of the patent’s prosecution history, including filings, correspondence, and decisions made by patent offices. These documents are crucial for understanding the patent’s legal journey and any challenges it may have faced during examination. It also includes the oppositions documents filed against the patent.
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