Compound, Material For Forming Underlayer Film For Lithography, Underlayer Film For Lithography, And Pattern Formation Method - EP2955577
The patent EP2955577 was granted to Mitsubishi GAS Chemical on Jan 31, 2018. The application was originally filed on Feb 4, 2014 under application number EP14749602A. The patent is currently recorded with a legal status of "No Opposition Filed Within Time Limit".
EP2955577
- Application Number
- EP14749602A
- Filing Date
- Feb 4, 2014
- Status
- No Opposition Filed Within Time Limit
- Dec 7, 2018
- Publication Date
- Jan 31, 2018
- External Links
- Slate, Register, Google Patents
Patent Summary
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Dossier Documents
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