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Device And Method For Handling Process Gases In A Plasma Stimulated By High Frequency Electromagnetic Waves - EP3011807

The patent EP3011807 was granted to Eeplasma on Nov 15, 2017. The application was originally filed on Jul 29, 2014 under application number EP14744363A. The patent is currently recorded with a legal status of "Opposition Rejected".

EP3011807

EEPLASMA
Application Number
EP14744363A
Filing Date
Jul 29, 2014
Status
Opposition Rejected
Jul 26, 2024
Grant Date
Nov 15, 2017
External Links
Slate, Register, Google Patents

Patent Summary

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Patent Family

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MUEGGEAug 16, 2018PAUL & ALBRECHT PATENTANWALTE PARTG MBBADMISSIBLE

Patent Citations (5) New

Patent citations refer to prior patents cited during different phases such as opposition or international search.

Citation PhasePublication NumberPublication Link
EXAMINATIONSU397139
INTERNATIONAL-SEARCH-REPORTEP0874537
INTERNATIONAL-SEARCH-REPORTUS2013002137
INTERNATIONAL-SEARCH-REPORTUS6198224
INTERNATIONAL-SEARCH-REPORTWO2013029593

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Dossier Documents

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