IP Verse

Device And Method For Handling Process Gases In A Plasma Stimulated By High Frequency Electromagnetic Waves - EP3011807B1

PatentPatent Analysis

EP3011807

EEPLASMA
Application Number
EP14744363A
Filing Date
Jul 29, 2014
Status
Opposition Rejected
Jul 26, 2024
Grant Date
Nov 15, 2017
External Links
Slate, Register, Google Patents

Bibliography

The patent EP3011807B1 was granted to Eeplasma on Nov 15, 2017 following the initial filing on Jul 29, 2014 under the application number EP14744363A . The current legal status of the patent is Opposition Rejected.

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Patent Oppositions

Patent oppositions filed by competitors challenge the validity of a granted patent. These oppositions are typically based on claims of prior art, lack of novelty, or non-obviousness. They are a key part of the process for determining a patent's strength and enforceability.

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MUEGGEAug 16, 2018ADMISSIBLE

Dossier Documents

The dossier documents provide a comprehensive record of the patent’s prosecution history, including filings, correspondence, and decisions made by patent offices. These documents are crucial for understanding the patent’s legal journey and any challenges it may have faced during examination. It also includes the oppositions documents filed against the patent.

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