IP Verse

Silicon Hairspring - EP3056948

The patent EP3056948 was granted to Master Dynamic on Feb 20, 2019. The application was originally filed on Feb 12, 2016 under application number EP16155566A. The patent is currently recorded with a legal status of "Opposition Rejected".

EP3056948

MASTER DYNAMIC
Application Number
EP16155566A
Filing Date
Feb 12, 2016
Status
Opposition Rejected
Oct 3, 2024
Grant Date
Feb 20, 2019
External Links
Slate, Register, Google Patents

Patent Summary

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Patent Family

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ROLEX SAPATEK PHILIPPE GENEVEICB INGENIEURS CONSEILS EN BREVETSNov 20, 2019MOINAS & SAVOYEADMISSIBLE

Patent Citations (22) New

Patent citations refer to prior patents cited during different phases such as opposition or international search.

Citation PhasePublication NumberPublication Link
DESCRIPTIONDE10127733
DESCRIPTIONEP0732635
DESCRIPTIONEP1422436
DESCRIPTIONEP2215531
DESCRIPTIONEP2224293
EXAMINATIONEP1422436
EXAMINATIONEP2105806
OPPOSITIONCH702431
OPPOSITIONCH708067
OPPOSITIONEP0732635
OPPOSITIONEP1422436
OPPOSITIONEP1605182
OPPOSITIONEP1837722
OPPOSITIONEP2105806
OPPOSITIONEP2284628
OPPOSITIONEP2727880
OPPOSITIONEP2765705
OPPOSITIONJPH06117470
OPPOSITIONWO2009068091
SEARCHEP1519250
SEARCHEP2597536
SEARCHWO2009068091

Non-Patent Literature (NPL) Citations (4) New

NPL citations refer to non-patent references such as research papers, articles, or other publications cited during examination or opposition phases.

Citation PhaseReference TextLink
OPPOSITION- "Silicon Crystallography", MARC MADOU, Fundamentals of microfabrication, CRC Press LLC, (19970000), pages 148 - 154, XP055654257-
OPPOSITION- VASSILI KARANASSIOS et al., "Anisotropic Wet Chemical Etching of Si for Chemical Analysis Applications", Sensors and Materials, (19970000), vol. 9, no. 7, pages 395 - 416, XP000933737-
OPPOSITION- XAVIER MELLHAOUI, "Mécanismes physico-chimiques dans le procédé de gravure plasma du silicium", Thèse, L’UNIVERSITE D’ORLEANS, (20060524), URL: https://tel.archives-ouvertes.fr/tel-00080722/document, XP055654254-
OPPOSITION- LIN ZHANG et al., "Anisotropic elasticity of silicon and its application to the modelling of X-ray optics", Journal of Synchrotron Radiation, International Union of Crystallography, (20140500), vol. 21, no. Pt 3, pages 507 - 517, XP055654252

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Dossier Documents

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