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Tialcn Layers With Lamellar Structure - EP3117021

The patent EP3117021 was granted to Walter on Jun 6, 2018. The application was originally filed on Mar 3, 2015 under application number EP15709872A. The patent is currently recorded with a legal status of "Opposition Rejected".

EP3117021

WALTER
Application Number
EP15709872A
Filing Date
Mar 3, 2015
Status
Opposition Rejected
Aug 18, 2023
Grant Date
Jun 6, 2018
External Links
Slate, Register, Google Patents

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KENNAMETALMar 1, 2019PRINZ & PARTNER MBB -

Patent Citations (8) New

Patent citations refer to prior patents cited during different phases such as opposition or international search.

Citation PhasePublication NumberPublication Link
INTERNATIONAL-SEARCH-REPORTEP0496516
INTERNATIONAL-SEARCH-REPORTWO2013134796
OPPOSITIONJP2001341008
OPPOSITIONJP2012016797
OPPOSITIONUS6040012
OPPOSITIONUS7767320
OPPOSITIONUS8389134
OPPOSITIONUS8394513

Non-Patent Literature (NPL) Citations (9) New

NPL citations refer to non-patent references such as research papers, articles, or other publications cited during examination or opposition phases.

Citation PhaseReference TextLink
OPPOSITION- "Advanced Chemical Vapor Deposition Coating Systems", Ionbond BernexTM CVD, (20170800), XP055601794-
OPPOSITION- "Al-rich Ti1−xAlxN - A New CVD Layer", Advancer® Newsletter, (20120300), pages 1 - 4, XP055324865-
OPPOSITION- H. HOLZSCHUH, "Chemical-vapor deposition of wear resistant hard coatings in the Ti-B-C-N system: properties and metal-cutting tests", 15th International Plansee Seminar , Reutte, (20010000), vol. 2, pages 441 - 451, XP055601780-
OPPOSITION- "Low pressure CVD Technology for TiAIN Coatings", (20130915), Ionbond, URL: https://www.ionbond.com/global-search/?tx_kesearch_pi1%5Bsword%5D=Low+pressure+CVD+Technology+for+TiAIN+Coatings, XP055601786-
OPPOSITION- Low Pressure CVD Technology for TiAIN Coatings, (20130915), URL: https://www.ionbond.com/technology/articles/details/low- pressure-cvd-tech nology-for-tia l n-coatings-
OPPOSITION- RANA et al., "A comparative study of SiC epitaxial growth in vertical hotwall CVD reactor using silane and dichlorosilane", (2012), pages 1 - 25, XP055601763-
OPPOSITION- WALTER AG, "CVD Aluminum Nitride Coatings for Cutting Applications", (20190228), pages 1 - 18, XP055601798-
OPPOSITION- ENDLER et al., "Aluminum-rich TiAlCN coatings by Low Pressure CVD", Surface & Coatings Technology, (20100000), vol. 205, pages 530 - 533, XP027507482
OPPOSITION- M. GORAL et al., "Kinetics Growth and Oxidation Resistance of Aluminide Coatings Deposited by the CVD Method on Re 80 Superalloy", Journal of Mineral and Materials Characterization and Engineering, (20120000), vol. 11, doi:10.4236/jmmce.2012.118078, pages 853 - 857, XP055601790

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