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Method And Apparatus For Lithography-Based Generative Production Of Three-Dimensional Articles - EP3266594
The patent EP3266594 was granted to Technische Universitt Wien on Mar 11, 2020. The application was originally filed on Jul 7, 2016 under application number EP16450014A. The patent is currently recorded with a legal status of "Granted And Under Opposition".
EP3266594
- Application Number
- EP16450014A
- Filing Date
- Jul 7, 2016
- Status
- Granted And Under Opposition
- Feb 7, 2020
- Publication Date
- Mar 11, 2020
- External Links
- Slate, Register, Google Patents
Patent Summary
A method for lithography-based additive manufacturing of three-dimensional components that combines high resolution with high throughput. The method involves irradiating material located between a construction platform and a tub floor with electromagnetic radiation in a location-selective manner, using a device that can vary the focal point volume during the manufacturing process. This allows for both high-resolution surface features and high-throughput interior structures to be achieved in a single manufacturing process.
Patent Family
Patent Oppositions (2)
Patent oppositions filed by competitors challenge the validity of a granted patent. These oppositions are typically based on claims of prior art, lack of novelty, or non-obviousness. They are a key part of the process for determining a patent's strength and enforceability.
Patent Citations (13) New
Patent citations refer to prior patents cited during different phases such as opposition or international search.
Dossier Documents
The dossier documents provide a comprehensive record of the patent's prosecution history - including filings, correspondence, and decisions made by patent offices - and are crucial for understanding the patent's legal journey and any challenges it may have faced during examination.
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