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A Method For Pre-Treating A Surface For Coating - EP3374537

The patent EP3374537 was granted to Sandvik on Oct 23, 2024. The application was originally filed on Oct 20, 2016 under application number EP16785435A. The patent is currently recorded with a legal status of "Patent Maintained As Amended".

EP3374537

SANDVIK
Application Number
EP16785435A
Filing Date
Oct 20, 2016
Status
Patent Maintained As Amended
Sep 19, 2024
Publication Date
Oct 23, 2024
External Links
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VOESTALPINE STAHLDec 22, 2022HGFADMISSIBLE

Patent Citations (5) New

Patent citations refer to prior patents cited during different phases such as opposition or international search.

Citation PhasePublication Number
DESCRIPTIONDE102008021912
DESCRIPTIONEP0126003
INTERNATIONAL-SEARCH-REPORTUS2011180389
INTERNATIONAL-SEARCH-REPORTUS5061512
OPPOSITIONUS2014311409

Non-Patent Literature (NPL) Citations (12) New

NPL citations refer to non-patent references such as research papers, articles, or other publications cited during examination or opposition phases.

Citation PhaseReference Text
INTERNATIONAL-SEARCH-REPORT- ANDERS ET AL, "Plasma and ion sources in large area coating: A review", SURFACE AND COATINGS TECHNOLOGY, ELSEVIER, AMSTERDAM, NL, (20051121), vol. 200, no. 5-6, doi:10.1016/J.SURFCOAT.2005.08.018, ISSN 0257-8972, pages 1893 - 1906, XP005173240 [A] 1-15 * figure 2 *
INTERNATIONAL-SEARCH-REPORT- E. BROITMAN ET AL, "Industrial-scale deposition of highly adherent CNx films on steel substrates", SURFACE AND COATINGS TECHNOLOGY, (20100331), vol. 204, no. 21-22, doi:10.1016/j.surfcoat.2010.03.038, ISSN 0257-8972, pages 3349 - 3357, XP055038818 [A] 1-15 * paragraph [0002] *
INTERNATIONAL-SEARCH-REPORT- ZENG Z M ET AL, "Ion enhanced deposition by dual titanium and acetylene plasma immersion ion implantation", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART A, AVS /AIP, MELVILLE, NY., US, (20021210), vol. 21, no. 1, doi:10.1116/1.1531136, ISSN 0734-2101, pages 175 - 179, XP012006265 [A] 1-15 *EXPERIMENT*
OPPOSITION- Gudmundsson J. T.; Brenning N.; Lundin D.; Helmersson U., "High power impulse magnetron sputtering discharge", Journal of Vacuum Science, American Institute of Physics, 2 Huntington Quadrangle, Melville, NY 11747, 2 Huntington Quadrangle, Melville, NY 11747, (20120501), vol. 30, no. 3, doi:10.1116/1.3691832, ISSN 0734-2101, pages 30801 - 030801-35
OPPOSITION- MUNZ W-D, ET AL, "Industrial applications of HIPIMS", JOURNAL OF PHYSICS: CONFERENCE SERIES, INSTITUTE OF PHYSICS PUBLISHING, BRISTOL, GB, GB , (20080301), vol. 100, no. Part. 8, doi:10.1088/1742-6596/100/8/082001, ISSN 1742-6596, pages 1 - 6
OPPOSITION- Vlček J., Pajdarová A. D., Musil J., "Pulsed dc Magnetron Discharges and their Utilization in Plasma Surface Engineering", CONTRIBUTIONS TO PLASMA PHYSICS., AKADEMIE VERLAG, BERLIN., DE, DE , (20040901), vol. 44, no. 56, doi:10.1002/ctpp.200410083, ISSN 0863-1042, pages 426 - 436, XP093012891
OPPOSITION- Ehiasarian A., Wen J., Petrov I., "Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion", Journal of Applied Physics, American Institute of Physics, 2 Huntington Quadrangle, Melville, NY 11747, 2 Huntington Quadrangle, Melville, NY 11747, (20070302), vol. 101, no. 5, doi:10.1063/1.2697052, ISSN 0021-8979, pages 054301 - 054301, XP012097937
OPPOSITION- Christian Maszl; Wolfgang Breilmann; Jan Benedikt; Achim von Keudell, "Origin of the energetic ions at the substrate generated during high power pulsed magnetron sputtering of titanium", arXiv.org, Cornell University Library, 201 Olin Library Cornell University Ithaca, NY 14853, 201 Olin Library Cornell University Ithaca, NY 14853 , (20140305), doi:10.1088/0022-3727/47/22/224002, XP081932111
OPPOSITION- MUNZ W-D, ET AL, "Industrial applications of HIPIMS", JOURNAL OF PHYSICS: CONFERENCE SERIES, INSTITUTE OF PHYSICS PUBLISHING, BRISTOL, GB, GB , (20080301), vol. 100, no. Part. 8, doi:10.1088/1742-6596/100/8/082001, ISSN 1742-6596, pages 1 - 6, XP002565193
OPPOSITION- E Broitman; L Hultman, "Adhesion improvement of carbon-based coatings through a high ionization deposition technique", JOURNAL OF PHYSICS: CONFERENCE SERIES, INSTITUTE OF PHYSICS PUBLISHING, BRISTOL, GB, GB , (20120619), vol. 370, no. 1, doi:10.1088/1742-6596/370/1/012009, ISSN 1742-6596, page 12009, XP020224817
OPPOSITION- Gudmundsson J. T.; Brenning N.; Lundin D.; Helmersson U., "High power impulse magnetron sputtering discharge", Journal of Vacuum Science, American Institute of Physics, 2 Huntington Quadrangle, Melville, NY 11747, 2 Huntington Quadrangle, Melville, NY 11747, (20120501), vol. 30, no. 3, doi:10.1116/1.3691832, ISSN 0734-2101, pages 30801 - 030801-35, XP012160411
OPPOSITION- Macák Karol, Kouznetsov Vladimir, Schneider Jochen, Helmersson Ulf, Petrov Ivan, "Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge", Journal of Vacuum Science, American Institute of Physics, 2 Huntington Quadrangle, Melville, NY 11747, 2 Huntington Quadrangle, Melville, NY 11747, (20000701), vol. 18, no. 4, doi:10.1116/1.582380, ISSN 0734-2101, pages 1533 - 1537, XP012005176

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