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IP Verse

Sputtering Target And Production Method Therefor - EP3467142

The patent EP3467142 was granted to JX Advanced Metals on Aug 3, 2022. The application was originally filed on Jun 7, 2017 under application number EP17810359A. The patent is currently recorded with a legal status of "Granted And Under Opposition".

EP3467142

JX ADVANCED METALS
Application Number
EP17810359A
Filing Date
Jun 7, 2017
Status
Granted And Under Opposition
Jul 1, 2022
Publication Date
Aug 3, 2022
External Links
Slate, Register, Google Patents

Patent Summary

Patent Family

Patent Family

Patent Oppositions

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MATERIONMay 2, 2023KADOR & PARTNER PART MBBADMISSIBLE

Patent Citations (26) New

Patent citations refer to prior patents cited during different phases such as opposition or international search.

Citation PhasePublication Number
DESCRIPTIONJP2012012673
DESCRIPTIONJP2015096647
INTERNATIONAL-SEARCH-REPORTJP2001303243
INTERNATIONAL-SEARCH-REPORTJP2003166053
INTERNATIONAL-SEARCH-REPORTJP2004204284
INTERNATIONAL-SEARCH-REPORTJP2010031378
INTERNATIONAL-SEARCH-REPORTJP2015096647
INTERNATIONAL-SEARCH-REPORTJPH02115364
INTERNATIONAL-SEARCH-REPORTJPH113873
INTERNATIONAL-SEARCH-REPORTUS2010285332
OPPOSITIONCN104805406
OPPOSITIONEP0855451
OPPOSITIONJP2004204284
OPPOSITIONJP2015096647
OPPOSITIONUS2002083571
OPPOSITIONUS2004140197
OPPOSITIONUS2008173543
OPPOSITIONUS2011318607
OPPOSITIONUS2012000766
OPPOSITIONUS2012107557
OPPOSITIONUS2014166481
OPPOSITIONUS8173093
OPPOSITIONUS9732413
SEARCHJP2004204284
SEARCHUS2014174908
SEARCHUS6329275

Dossier Documents

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