IP Verse

Sputtering Target And Production Method Therefor - EP3467142

The patent EP3467142 was granted to JX Advanced Metals on Aug 3, 2022. The application was originally filed on Jun 7, 2017 under application number EP17810359A. The patent is currently recorded with a legal status of "Granted And Under Opposition".

EP3467142

JX ADVANCED METALS
Application Number
EP17810359A
Filing Date
Jun 7, 2017
Status
Granted And Under Opposition
Jul 1, 2022
Grant Date
Aug 3, 2022
External Links
Slate, Register, Google Patents

Patent Summary

Patent Family

Patent Family

Patent Oppositions

Patent oppositions filed by competitors challenge the validity of a granted patent. These oppositions are typically based on claims of prior art, lack of novelty, or non-obviousness. They are a key part of the process for determining a patent's strength and enforceability.

CompanyOpposition DateRepresentativeOpposition Status

Get instant alerts for new oppositions and patent status changes

MATERIONMay 2, 2023KADOR & PARTNER PART MBBADMISSIBLE

Patent Citations (26) New

Patent citations refer to prior patents cited during different phases such as opposition or international search.

Citation PhasePublication NumberPublication Link
DESCRIPTIONJP2012012673
DESCRIPTIONJP2015096647
INTERNATIONAL-SEARCH-REPORTJP2001303243
INTERNATIONAL-SEARCH-REPORTJP2003166053
INTERNATIONAL-SEARCH-REPORTJP2004204284
INTERNATIONAL-SEARCH-REPORTJP2010031378
INTERNATIONAL-SEARCH-REPORTJP2015096647
INTERNATIONAL-SEARCH-REPORTJPH02115364
INTERNATIONAL-SEARCH-REPORTJPH113873
INTERNATIONAL-SEARCH-REPORTUS2010285332
OPPOSITIONCN104805406
OPPOSITIONEP0855451
OPPOSITIONJP2004204284
OPPOSITIONJP2015096647
OPPOSITIONUS2002083571
OPPOSITIONUS2004140197
OPPOSITIONUS2008173543
OPPOSITIONUS2011318607
OPPOSITIONUS2012000766
OPPOSITIONUS2012107557
OPPOSITIONUS2014166481
OPPOSITIONUS8173093
OPPOSITIONUS9732413
SEARCHJP2004204284
SEARCHUS2014174908
SEARCHUS6329275

Non-Patent Literature (NPL) Citations (13) New

NPL citations refer to non-patent references such as research papers, articles, or other publications cited during examination or opposition phases.

Citation PhaseReference TextLink
OPPOSITION- Anonymous, "Al [5N5] Sputtering Targets", Heraeus, (20060301), XP093265996-
OPPOSITION- Anonymous, "Aluminium Alloy [5N5] Sputtering Targets ", Heraeus, (20060301), XP093266097-
OPPOSITION- Anonymous, "JIS Z 2244 (JISF) Vickers hardness test - Test method", JIS Japanese Industrial Standard, (20090101), pages 1 - 115, XP093047697-
OPPOSITION- Anonymous, "Scandium Metal - Quality Data", Hefa Rare Earth Canada Co. Ltd, (20130703), XP093265987-
OPPOSITION- Carter D C, "Arc Prevention in Magnetron Sputtering Processes", 51stAnnual Technical Conference Proceeding, (20080424), pages 380 - 385, XP093280680-
OPPOSITION- D37 - Analysis report by Auer Remy for a Sc metal with an oxygen content of 1,000 ppm dated June 20, 2013; provided with an order confirmation-
OPPOSITION- K. KANO et al., "Enhancement of Piezoelectric Response in Scandium Aluminum Nitride Alloy Thin Films prepared by Dual Reactive Co-Sputtering", DENSO Technical Review, (20120000), vol. 17, pages 202 - 207, XP093047711-
OPPOSITION- Pavate, Vikram; Abburi, Murali; Chiang, Sunny; Hansen, Keith; Mori, Glen; Narasimhan, Murali; Ramaswami, Sesh; Nulman, Jaim; Restaino, Daryl, "Correlation between aluminum alloy sputtering target metallurgical characteristics, arc initiation, and in-film defect density", (19970101), vol. 3214, pages 42 - 47, XP009096283-
OPPOSITION- Akiyama Morito et al, "Influence of oxygen concentration in sputtering gas on piezoelectric response of aluminum nitride thin films", Applied Physics Letters, 2 Huntington Quadrangle, Melville, NY 11747, (20080714), vol. 93, no. 2, doi:10.1063/1.2957654, ISSN 0003-6951, pages 021903 - 021903-3, XP012112414
OPPOSITION- M. SUZUKI et al., "Polarity-inverted ScAIN film growth by ion beam irradiation and application to overtone acoustic wave (000-1)/(0001) film resonators", Appl. Phys. Lett., (20140000), vol. 104, doi:10.1063/1.4874840, page 172905, XP012185143
OPPOSITION- J. ROYSET et al., "Scandium in aluminium alloy s", Int. Mat. Rev., (20050000), vol. 50, pages 19 - 44, XP008065171
OPPOSITION- M. AKIYAMA et al., "Preparation of scandium aluminum nitride thin films using scandium aluminum alloy sputtering target and design of experiments", J. Ceram. Soc. Jpn., (20100000), vol. 118, no. 12, doi:10.2109/jcersj2.118.1166, pages 1166 - 1169, XP055724685
OPPOSITION- Masahiro Sumisaka et al, "Sputter deposition of ScAlN using large size alloy target with high Sc content and reduction of Sc content in deposited films", Japanese journal of applied physics, JP , (20150701), vol. 54, no. 7S1, doi:10.7567/JJAP.54.07HD06, ISSN 0021-4922, page 07HD06, XP055483117

Download Citation Report

Get a free citation report including examiner, opposition, and international search citations.

Get Citation Report

Dossier Documents

The dossier documents provide a comprehensive record of the patent’s prosecution history - including filings, correspondence, and decisions made by patent offices - and are crucial for understanding the patent’s legal journey and any challenges it may have faced during examination.

  • Date

    Description

  • Get instant alerts for new documents