Method For Producing A 3D Structure By Means Of Laser Lithography With A Modified Exposure Dose At Edge Portions, And Corresponding Computer Program Product - EP3621766

The patent EP3621766 was granted to Nanoscribe on Jan 5, 2022. The application was originally filed on Feb 7, 2018 under application number EP18703777A. The patent is currently recorded with a legal status of "Granted And Under Opposition".

EP3621766

NANOSCRIBE
Application Number
EP18703777A
Filing Date
Feb 7, 2018
Status
Granted And Under Opposition
Dec 3, 2021
Grant Date
Jan 5, 2022
External Links
Slate, Register, Google Patents

Patent Summary

Patent Family

Patent Family

Patent Oppositions (3)

Patent oppositions filed by competitors challenge the validity of a granted patent. These oppositions are typically based on claims of prior art, lack of novelty, or non-obviousness. They are a key part of the process for determining a patent's strength and enforceability.

CompanyOpposition DateRepresentativeOpposition Status

Get instant alerts for new oppositions and patent status changes

UPNANOOct 5, 2022SONN PATENTANWALTEADMISSIBLE
MULTIPHOTON OPTICSOct 5, 2022STREHL & PARTNERWITHDRAWN
MULTIPHOTON OPTICSOct 5, 2022STREHL SCHUBEL HOPF & PARTNERWITHDRAWN

Patent Citations (11) New

Patent citations refer to prior patents cited during different phases such as opposition or international search.

Citation PhasePublication NumberPublication Link
DESCRIPTIONUS4575330
DESCRIPTIONUS5247180
EXAMINATIONUS6730256
INTERNATIONAL-SEARCH-REPORTEP0606839
INTERNATIONAL-SEARCH-REPORTEP3093123
INTERNATIONAL-SEARCH-REPORTJP2015124395
INTERNATIONAL-SEARCH-REPORTUS2015183165
INTERNATIONAL-SEARCH-REPORTUS2016046070
INTERNATIONAL-SEARCH-REPORTUS2017066052
OPPOSITIONEP2186625
OPPOSITIONWO2017062630

Non-Patent Literature (NPL) Citations (10) New

NPL citations refer to non-patent references such as research papers, articles, or other publications cited during examination or opposition phases.

Citation PhaseReference TextLink
OPPOSITION- Chao-Yaug Liao, "Product Model Creation and Simulation for Two-photon Polymerization Micro-manufacturing", Dissertation, National Taiwan University, National Taiwan University , (20080101), pages i-xx, 1 - 170, Dissertation, URL: https://tel.archives-ouvertes.fr/tel-00417799/document, (20190628), XP055600585-
OPPOSITION- HASKE et al., "65 nm feature sizes using visible wavelength 3-D multiphoton lithography", Optics Express, (20070000), vol. 15, no. 6, pages 1 - 3, XP055974061-
OPPOSITION- TAN et al., "Effects of pulsewidth on two-photon polymerization", Designed Monomers and Polymers, (20130300), vol. 16, no. 2, pages 145 - 150, XP055974064-
OPPOSITION- YANG et al., "Additive Process Using Femto-second Laser for Manufacturing Three-dimensional Nano/Micro-structures", International Journal of Precision Engineering and Manufacturing, (20070000), vol. 8, no. 4, pages 63 - 69, XP055974055-
OPPOSITION- T.W. LIM et al., "Direct single-layered fabrication of 3D concavo-convex patterns in nano-stereolithography", Appl.Phys. A, (20060000), vol. 84, doi:10.1007/s00339-006-3633-x, pages 379 - 383, XP055971911
OPPOSITION- T.W. Lim ; S.H. Park ; D.Y. Yang ; H.J. Kong ; K.S. Lee, "Direct single-layered fabrication of 3D concavo-convex patterns in nano-stereolithography", APPLIED PHYSICS A; MATERIALS SCIENCE & PROCESSING, Springer, Berlin, DE, Berlin, DE , (20060620), vol. 84, no. 4, doi:10.1007/s00339-006-3633-x, ISSN 1432-0630, pages 379 - 383, XP019424417
OPPOSITION- Park In-Baek, Ha Young-Myoung, Kim Min-Sub, Kim Ho-Chan, Lee Seok-Hee, "Three-dimensional grayscale for improving surface quality in projection microstereolithography", INTERNATIONAL JOURNAL OF PRECISION ENGINEERING AND MANUFACTURING, HAN'GUK-CHONGMIL-KONGHAKHOE,, Springer, Springer , (20120201), vol. 13, no. 2, doi:10.1007/s12541-012-0036-0, ISSN 1229-8557, pages 291 - 298, XP055973113
OPPOSITION- Park Sang, Lee Sang, Yang Dong-Yol, Kong Hong, Lee Kwang-Sup, "Subregional slicing method to increase three-dimensional nanofabrication efficiency in two-photon polymerization", Applied Physics Letters, American Institute of Physics, 2 Huntington Quadrangle, Melville, NY 11747, 2 Huntington Quadrangle, Melville, NY 11747, (20051007), vol. 87, no. 15, doi:10.1063/1.2103393, ISSN 0003-6951, pages 154108 - 154108, XP012076000
OPPOSITION- PART et al., "Subregional slicing method to increase three-dimensional nanofabrication efficiency in two-photon polymerization", Applied Physics Letters, (20050000), vol. 87, no. 15, doi:10.1063/1.2103393, pages 154108 - 154108-3, XP012076000
OPPOSITION- Yang Dong-Yol; Park Sang; Lim Tae; Kong Hong-Jin; Yi Shin; Yang Hyun; Lee Kwang-Sup, "Ultraprecise microreproduction of a three-dimensional artistic sculpture by multipath scanning method in two-photon photopolymerization", Applied Physics Letters, (20070000), vol. 90, no. 1, pages 13113 - - 013113-3, XP012093384

Download Citation Report

Get a free citation report including examiner, opposition, and international search citations.

Get Citation Report

Dossier Documents

The dossier documents provide a comprehensive record of the patent’s prosecution history - including filings, correspondence, and decisions made by patent offices - and are crucial for understanding the patent’s legal journey and any challenges it may have faced during examination.

  • Date

    Description

  • Get instant alerts for new documents