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Method For Producing A 3D Structure By Means Of Laser Lithography With A Modified Exposure Dose At Edge Portions, And Corresponding Computer Program Product - EP3621766

The patent EP3621766 was granted to Nanoscribe on Jan 5, 2022. The application was originally filed on Feb 7, 2018 under application number EP18703777A. The patent is currently recorded with a legal status of "Granted And Under Opposition".

EP3621766

NANOSCRIBE
Application Number
EP18703777A
Filing Date
Feb 7, 2018
Status
Granted And Under Opposition
Dec 3, 2021
Publication Date
Jan 5, 2022
External Links
Slate, Register, Google Patents

Patent Summary

Patent Family

Patent Family

Patent Oppositions (3)

Patent oppositions filed by competitors challenge the validity of a granted patent. These oppositions are typically based on claims of prior art, lack of novelty, or non-obviousness. They are a key part of the process for determining a patent's strength and enforceability.

CompanyOpposition DateRepresentativeOpposition Status

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UPNANOOct 5, 2022SONN PATENTANWALTEADMISSIBLE
MULTIPHOTON OPTICSOct 5, 2022STREHL & PARTNERWITHDRAWN
MULTIPHOTON OPTICSOct 5, 2022STREHL SCHUBEL HOPF & PARTNERWITHDRAWN

Patent Citations (11) New

Patent citations refer to prior patents cited during different phases such as opposition or international search.

Citation PhasePublication Number
DESCRIPTIONUS4575330
DESCRIPTIONUS5247180
EXAMINATIONUS6730256
INTERNATIONAL-SEARCH-REPORTEP0606839
INTERNATIONAL-SEARCH-REPORTEP3093123
INTERNATIONAL-SEARCH-REPORTJP2015124395
INTERNATIONAL-SEARCH-REPORTUS2015183165
INTERNATIONAL-SEARCH-REPORTUS2016046070
INTERNATIONAL-SEARCH-REPORTUS2017066052
OPPOSITIONEP2186625
OPPOSITIONWO2017062630

Dossier Documents

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