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Method For Manufacturing Timepiece Hairsprings - EP3845770

The patent EP3845770 was granted to Sigatec on Jun 28, 2023. The application was originally filed on Aug 21, 2020 under application number EP20192120A. The patent is currently recorded with a legal status of "Granted And Under Opposition".

EP3845770

SIGATEC
Application Number
EP20192120A
Filing Date
Aug 21, 2020
Status
Granted And Under Opposition
May 26, 2023
Grant Date
Jun 28, 2023
External Links
Slate, Register, Google Patents

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ICB INGENIEURS CONSEILS EN BREVETSMar 28, 2024HOFFMANN EITLEADMISSIBLE

Patent Citations (21) New

Patent citations refer to prior patents cited during different phases such as opposition or international search.

Citation PhasePublication NumberPublication Link
DESCRIPTIONEP1422436
DESCRIPTIONEP2423764
DESCRIPTIONEP3181938
DESCRIPTIONWO2015113973
EXAMINATIONEP3457224
OPPOSITIONEP2423764
OPPOSITIONEP3181938
OPPOSITIONJP2015179067
OPPOSITIONUS8782572
OPPOSITIONWO0072090
OPPOSITIONWO2005103827
OTHERCN105223773
OTHEREP1121622
OTHEREP1649323
OTHEREP2423764
OTHEREP3412625
OTHERUS2011127883
OTHERUS6136478
SEARCHEP3412625
SEARCHEP3457224
SEARCHEP3543796

Non-Patent Literature (NPL) Citations (8) New

NPL citations refer to non-patent references such as research papers, articles, or other publications cited during examination or opposition phases.

Citation PhaseReference TextLink
OPPOSITION- Daveau Vincent, "In-Depth: Ulysse Nardin And SIGATEC: Project Code Name "Si"", (20180814), URL: https://www.watchonista.com/articles/depth/depth-ulysse-nardin-and-sigatec-project-code-name-si, XP093186381-
OPPOSITION- SYED RIZVI, "Frontmatter; HANDBOOK OF PHOTOMASK MANUFACTURING TECHNOLOGY", SYED RIZVI, SYED RIZVI, HANDBOOK OF PHOTOMASK MANUFACTURING TECHNOLOGY, Taylor & Francis, (20050407), pages 1 - 878, ISBN 978-0-8247-5374-0, XP009556008-
OPPOSITION- Schellenberg Franklin M, Schellenberg Franklin M, Zhang Hua, Morrow Jim, "Evaluation of OPC efficacy", Proceedings of SPIE, SPIE, (19960101), vol. 2726, doi:10.1117/12.240986, pages 680 - 688, XP093186389
OPPOSITION- Schneider Jens, Bloecker Martin, Ballhorn Gerd, Belic Nikola, Eisenmann Hans, Keogan Danny, "Compensation of long-range process effects on photomasks by design data correction", 22nd Annual BACUS Symposium on Photomask Technology, SPIE, (20021224), vol. 4889, doi:10.1117/12.467572, page 59, XP093186387
OPPOSITION- Harry J. Levinson, "Chapter 1 Overview of Lithography", Harry J. Levinson, HARRY J. LEVINSON, PRINCIPLES OF LITHOGRAPHY, 3rd Edition, SPIE Press, (20100101), pages 1 - 6, doi:10.1117/3.865363.ch1, ISBN 978-0-8194-8324-9, XP009558889
OPPOSITION- HARRY J. LEVINSON, "Chapter 7 Masks and Reticles", HARRY J. LEVINSON, HARRY J. LEVINSON, PRINCIPLES OF LITHOGRAPHY, 3rd Edition, SPIE Press, (20100101), pages 257 - 306, doi:10.1117/3.865363.ch7, ISBN 978-0-8194-8324-9, XP009558890
OPPOSITION- HARRY J. LEVINSON, "Chapter 8 Confronting the Diffraction Limit", HARRY J. LEVINSON, HARRY J. LEVINSON, PRINCIPLES OF LITHOGRAPHY, 3rd Edition, SPIE Press, (20100101), pages 307 - 350, doi:10.1117/3.865363.ch8, ISBN 978-0-8194-8324-9, XP009558891
OTHER- W. Noell ; P.-A. Clerc ; S. Jeanneret ; A. Perret ; N.F. de Rooij, "MEMS for a watches", Micro Electro Mechanical Systems, 2004. 17th IEEE International Conference on. (MEMS), US , (20040125), doi:10.1109/MEMS.2004.1290507, ISBN 978-0-7803-8265-7, pages 1 - 4, XP032415758

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