Pattern Formation Apparatus For Base Material And Pattern Formation Method - EP3995249
The patent EP3995249 was granted to Ricoh on Apr 17, 2024. The application was originally filed on Oct 13, 2021 under application number EP21202411A. The patent is currently recorded with a legal status of "Granted And Under Opposition".
EP3995249
- Application Number
- EP21202411A
- Filing Date
- Oct 13, 2021
- Status
- Granted And Under Opposition
- Mar 15, 2024
- Grant Date
- Apr 17, 2024
- External Links
- Slate, Register, Google Patents
Patent Summary
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