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3D Additive Manufacturing System, 3D Additive Manufacturing Method, Additive Manufacturing Control Device, And Control Method And Control Program For Additive Manufacturing Control Device - EP3272505

The patent EP3272505 was granted to Matsuura Machinery on May 12, 2021. The application was filed on May 31, 2016 under application number EP16823146A. The patent is currently recorded with a legal status of "Revoked".

EP3272505

MATSUURA MACHINERY
Application Number
EP16823146A
Filing Date
May 31, 2016
Status
Revoked
Nov 3, 2023
Publication Date
May 12, 2021
External Links
Slate, Register, Google Patents

Patent Summary

Patent Family

Patent Family

Patent Oppositions (2)

Patent oppositions filed by competitors challenge the validity of a granted patent. These oppositions are typically based on claims of prior art, lack of novelty, or non-obviousness. They are a key part of the process for determining a patent's strength and enforceability.

CompanyOpposition DateRepresentativeOpposition Status
RENISHAWFeb 11, 2022MATTHEWSADMISSIBLE
SLM SOLUTIONS GROUPFeb 11, 2022SCHICKERADMISSIBLE

Patent Citations (21) New

Patent citations refer to prior patents cited during different phases such as opposition or international search.

Citation PhasePublication Number
DESCRIPTIONJP2015078434
INTERNATIONAL-SEARCH-REPORTJP2010265530
INTERNATIONAL-SEARCH-REPORTJP2014201068
INTERNATIONAL-SEARCH-REPORTJP2015175012
INTERNATIONAL-SEARCH-REPORTJP2015199195
INTERNATIONAL-SEARCH-REPORTJP5826430B
INTERNATIONAL-SEARCH-REPORTWO2011049143
INTERNATIONAL-SEARCH-REPORTWO2014125258
OPPOSITIONDE102014217786
OPPOSITIONJP2002144437
OPPOSITIONJP2009006509
OPPOSITIONUS2014271965
OPPOSITIONWO2014125280
OPPOSITIONWO2014154878
OPPOSITIONWO2014199134
OPPOSITIONWO2014199149
OPPOSITIONWO2014199150
SEARCHEP2926925
SEARCHUS2010044547
SEARCHUS2014271965
SEARCHUS2016136731

Dossier Documents

The dossier documents provide a comprehensive record of the patent's prosecution history - including filings, correspondence, and decisions made by patent offices - and are crucial for understanding the patent's legal journey and any challenges it may have faced during examination.

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    Description

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