Device And Method For Handling Process Gases In A Plasma Stimulated By High Frequency Electromagnetic Waves

Patent No. EP3011807 (titled "Device And Method For Handling Process Gases In A Plasma Stimulated By High Frequency Electromagnetic Waves") was filed by Eeplasma on Jul 29, 2014. The application was issued on Nov 15, 2017.

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CompanyOpposition DateRepresentative
MUEGGEAug 16, 2018PAUL & ALBRECHT PATENTANWALTE PARTG MBB

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EP3011807

EEPLASMA
Application Number
EP14744363A
Filing Date
Jul 29, 2014
Status
Opposition Rejected
Jul 26, 2024
Publication Date
Nov 15, 2017