Method And Apparatus For Lithography-Based Generative Production Of Three-Dimensional Articles

Patent No. EP3266594 (titled "Method And Apparatus For Lithography-Based Generative Production Of Three-Dimensional Articles") was filed by Technische Universitt Wien on Jul 7, 2016. The application was issued on Mar 11, 2020.

Patent Summary

A method for lithography-based additive manufacturing of three-dimensional components that combines high resolution with high throughput. The method involves irradiating material located between a construction platform and a tub floor with electromagnetic radiation in a location-selective manner, using a device that can vary the focal point volume during the manufacturing process. This allows for both high-resolution surface features and high-throughput interior structures to be achieved in a single manufacturing process.

Patent Family

Patent Family

Patent Oppositions (2)

Patent oppositions filed by competitors challenge the validity of a granted patent. These oppositions are typically based on claims of prior art, lack of novelty, or non-obviousness. They are a key part of the process for determining a patent's strength and enforceability.

CompanyOpposition DateRepresentative
MULTIPHOTON OPTICSDec 11, 2020STREHL SCHUBEL HOPF & PARTNER
HEIDELBERG INSTRUMENTS MIKROTECHNIKDec 11, 2020DUMLICH

Dossier Documents

The dossier documents provide a comprehensive record of the patent's prosecution history - including filings, correspondence, and decisions made by patent offices - and are crucial for understanding the patent's legal journey and any challenges it may have faced during examination.

  • Date

    Description

  • Get instant alerts for new documents

EP3266594

TECHNISCHE UNIVERSITT WIEN
Application Number
EP16450014A
Filing Date
Jul 7, 2016
Status
Granted And Under Opposition
Feb 7, 2020
Publication Date
Mar 11, 2020