Method And Apparatus For Lithography-Based Generative Production Of Three-Dimensional Articles

Patent No. EP3266594 (titled "Method And Apparatus For Lithography-Based Generative Production Of Three-Dimensional Articles") was filed by Technische Universitt Wien on Jul 7, 2016. The application was issued on Mar 11, 2020.

Patent Summary

A method for lithography-based additive manufacturing of three-dimensional components that combines high resolution with high throughput. The method involves irradiating material located between a construction platform and a tub floor with electromagnetic radiation in a location-selective manner, using a device that can vary the focal point volume during the manufacturing process. This allows for both high-resolution surface features and high-throughput interior structures to be achieved in a single manufacturing process.

Patent Family

Patent family tree
Statuses, jurisdictions and citation links are shared on request.

Patent Oppositions (2)

Patent oppositions filed by competitors challenge the validity of a granted patent. These oppositions are typically based on claims of prior art, lack of novelty, or non-obviousness. They are a key part of the process for determining a patent's strength and enforceability.

CompanyOpposition DateRepresentative
MULTIPHOTON OPTICSDec 11, 2020STREHL SCHUBEL HOPF & PARTNER
HEIDELBERG INSTRUMENTS MIKROTECHNIKDec 11, 2020DUMLICH

Dossier Documents

The dossier documents provide a comprehensive record of the patent's prosecution history - including filings, correspondence, and decisions made by patent offices - and are crucial for understanding the patent's legal journey and any challenges it may have faced during examination.

  • Date

    Description

EP3266594

TECHNISCHE UNIVERSITT WIEN
Application Number
EP16450014A
Filing Date
Jul 7, 2016
Status
Granted And Under Opposition
Feb 7, 2020
Publication Date
Mar 11, 2020