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Method For Producing Highly Dispersed Silicon Dioxide

Patent No. EP3580173 (titled "Method For Producing Highly Dispersed Silicon Dioxide") was filed by Wacker Chemie on Jul 13, 2017. The application was issued on Oct 20, 2021.

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EVONIK OPERATIONSMay 25, 2022EVONIK PATENT ASSOCIATION

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EP3580173

WACKER CHEMIE
Application Number
EP17751618A
Filing Date
Jul 13, 2017
Status
Opposition Rejected
Jul 11, 2025
Publication Date
Oct 20, 2021
External Links
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