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Method For Producing A 3D Structure By Means Of Laser Lithography With A Modified Exposure Dose At Edge Portions, And Corresponding Computer Program Product

Patent No. EP3621766 (titled "Method For Producing A 3D Structure By Means Of Laser Lithography With A Modified Exposure Dose At Edge Portions, And Corresponding Computer Program Product") was filed by Nanoscribe on Feb 7, 2018. The application was issued on Jan 5, 2022.

Patent Summary

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Patent Family

Patent Oppositions (3)

Patent oppositions filed by competitors challenge the validity of a granted patent. These oppositions are typically based on claims of prior art, lack of novelty, or non-obviousness. They are a key part of the process for determining a patent's strength and enforceability.

CompanyOpposition DateRepresentative
UPNANOOct 5, 2022SONN PATENTANWALTE
MULTIPHOTON OPTICSOct 5, 2022STREHL & PARTNER
MULTIPHOTON OPTICSOct 5, 2022STREHL SCHUBEL HOPF & PARTNER

Dossier Documents

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EP3621766

NANOSCRIBE
Application Number
EP18703777A
Filing Date
Feb 7, 2018
Status
Granted And Under Opposition
Dec 3, 2021
Publication Date
Jan 5, 2022
External Links
Slate, Register , Google Patents