Thermal Control Wafer With Integrated Heating-Sensing Elements

Patent No. US12085609 (titled "Thermal Control Wafer With Integrated Heating-Sensing Elements") was filed by Aem Singapore Pte Ltd on Aug 23, 2023.

What is this patent about?

’609 is related to the field of integrated circuit (IC) chip testing, specifically wafer probe testing, where IC chips are electrically tested while still part of a semiconductor wafer. The background involves applying signals to electrical pads on the IC chip using a wafer prober interface to determine if the chips meet performance criteria. Existing systems use thermal control elements, such as heated or cooled chucks, to maintain accurate and stable temperatures during testing. However, these systems may not adequately respond to localized temperature changes or quickly transition between set point temperatures, leading to costly idle time for expensive test systems.

The underlying idea behind ’609 is to use a thermal control wafer (TCW) with independently controllable heater zones, each containing a heater-sensing element . This element serves a dual purpose: it generates heat through Joule heating during a heating mode and provides a resistance reading during a sensing mode. By using the same element for both heating and sensing, the system can more accurately and efficiently control the temperature of individual DUTs or groups of DUTs on the wafer.

The claims of ’609 focus on an apparatus for controlling the temperature of devices under test (DUTs) using a thermal control wafer (TCW). The TCW includes a plurality of independently controllable heater zones, each with a heater-sensing element. This element, a resistive trace, generates heat during a heating mode and provides a resistance value during a sensing mode. A thermal controller determines the temperature of each heater zone based on the resistance of its heater-sensing element. The apparatus also includes a coldplate disposed under the TCW.

In practice, the TCW is placed between the wafer under test (WUT) and a coldplate. The thermal controller activates specific heater zones to heat the corresponding DUTs to a desired temperature. During the sensing mode, the controller measures the resistance of the heater-sensing element in each zone to determine its temperature. This feedback allows the controller to precisely adjust the power supplied to each heater zone, maintaining the DUTs at the required temperature for testing. The coldplate helps to dissipate heat and maintain a stable base temperature.

’609 differentiates itself from prior approaches by integrating the heating and sensing functions into a single element within each heater zone. This eliminates the need for separate heaters and temperature sensors, reducing the number of electrical connections and simplifying the design. Furthermore, the independent control of each heater zone allows for more precise temperature management of individual DUTs or groups of DUTs, addressing the limitations of traditional chuck-based thermal control systems that struggle with localized temperature variations. The use of a TCW also enables faster temperature transitions, reducing test system idle time and improving overall testing efficiency.

How does this patent fit in bigger picture?

Technical landscape at the time

In the early 2020s when ’609 was filed, integrated circuit (IC) testing at both the wafer and package level was a well-established practice, at a time when thermal control during testing was typically implemented using chucks or thermal control elements with relatively large thermal mass. At that time, achieving rapid and precise temperature control for high-performance ICs during testing was non-trivial, when systems commonly relied on feedback from temperature sensors to adjust heating or cooling, but localized temperature variations and slow thermal response times remained challenges.

Novelty and Inventive Step

The application was initially rejected. Claims 1-7 and 17 were rejected under 35 U.S.C. 102, and claims 2-6 were rejected under 35 U.S.C. 103. Claims 8-16 and 18-29 were objected to as being dependent upon a rejected base claim. The prosecution record does NOT describe the technical reasoning or specific claim changes that led to allowance.

Claims

This patent contains 28 claims, with claim 1 being the only independent claim. Independent claim 1 is directed to an apparatus for controlling temperatures of heater zones related to devices under test, comprising a thermal control wafer with independently controllable heater zones, a coldplate, and a thermal controller. The dependent claims generally elaborate on the specific configurations, materials, and features of the thermal control wafer and its components, as well as the interface with the devices under test.

Key Claim Terms New

Definitions of key terms used in the patent claims.

Term (Source)Support for SpecificationInterpretation
Coldplate
(Claim 1)
“The apparatus comprises: a thermal control wafer (TCW) comprising the plurality of heater zones, wherein the plurality of heaters zones is independently controllable and configured to heat the DUTs, wherein at least one of the plurality of heater zones has: a heater-sensing element comprising a resistive trace that: generates heat through Joule heating during a heating mode, and provides a resistance during a sensing mode; a coldplate disposed under the TCW, wherein the TCW is disposed below the DUTs; and a thermal controller configured to determine a temperature of the at least one heater zone based on the resistance.”A component disposed under the TCW, used to cool or maintain the temperature of the TCW.
Heater-sensing element
(Claim 1)
“The apparatus comprises: a thermal control wafer (TCW) comprising the plurality of heater zones, wherein the plurality of heaters zones is independently controllable and configured to heat the DUTs, wherein at least one of the plurality of heater zones has: a heater-sensing element comprising a resistive trace that: generates heat through Joule heating during a heating mode, and provides a resistance during a sensing mode; and a thermal controller configured to determine a temperature of the at least one heater zone based on the resistance.”A component within a heater zone that both generates heat and provides a resistance reading for temperature sensing.
Joule heating
(Claim 1)
“The apparatus comprises: a thermal control wafer (TCW) comprising the plurality of heater zones, wherein the plurality of heaters zones is independently controllable and configured to heat the DUTs, wherein at least one of the plurality of heater zones has: a heater-sensing element comprising a resistive trace that: generates heat through Joule heating during a heating mode, and provides a resistance during a sensing mode; and a thermal controller configured to determine a temperature of the at least one heater zone based on the resistance.”The process of generating heat by passing an electrical current through the resistive trace.
Resistive trace
(Claim 1)
“The apparatus comprises: a thermal control wafer (TCW) comprising the plurality of heater zones, wherein the plurality of heaters zones is independently controllable and configured to heat the DUTs, wherein at least one of the plurality of heater zones has: a heater-sensing element comprising a resistive trace that: generates heat through Joule heating during a heating mode, and provides a resistance during a sensing mode; and a thermal controller configured to determine a temperature of the at least one heater zone based on the resistance.”A conductive path within the heater-sensing element that generates heat through Joule heating and provides a resistance value indicative of temperature.
Thermal control wafer (TCW)
(Claim 1)
“The apparatus comprises: a thermal control wafer (TCW) comprising the plurality of heater zones, wherein the plurality of heaters zones is independently controllable and configured to heat the DUTs, wherein at least one of the plurality of heater zones has: a heater-sensing element comprising a resistive trace that: generates heat through Joule heating during a heating mode, and provides a resistance during a sensing mode; and a thermal controller configured to determine a temperature of the at least one heater zone based on the resistance.”A wafer comprising a plurality of independently controllable heater zones configured to heat devices under test (DUTs).

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US12085609

AEM SINGAPORE PTE LTD
Application Number
US18454737
Filing Date
Aug 23, 2023
Status
Granted
Expiry Date
Aug 23, 2043
External Links
Slate, USPTO, Google Patents