The detailed information for PTAB case with proceeding number IPR2017-01493 filed by Micron Technology, Inc. against PRESIDENT AND FELLOWS OF HARVARD COLLEGE on May 26, 2017. This includes filing dates, application numbers, tech centers, patent numbers, and current case status.

Case Details

Proceeding Number
IPR2017-01493
Filing Date
May 26, 2017
Petitioner
Micron Technology, Inc.
Respondent
PRESIDENT AND FELLOWS OF HARVARD COLLEGE
Status
Institution Denied
Respondent Application Number
10381628
Respondent Tech Center
1700
Respondent Patent Number
6969539
Institution Decision Date
Dec 8, 2017

Proceeding Documents

The table below shows documents filed in the case, listing each document name, filing date, document type, and filing party. Tracking these filings indicates the activity of the parties involved in the case, and the types of documents filed can provide insights into the legal strategies being employed.


Document NameFiling DateCategoryFiling Party

Alert me when new update on this case

Trial Instituted Document

Dec 8, 2017PAPERBOARD

PO Preliminary Response

Sep 19, 2017PAPERPATENT OWNER

Ex. 2101

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2102

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2104

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2108

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2109

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2111

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2112

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2113

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2114

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2115

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2117

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2103

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2105

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2106

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2107

Sep 19, 2017EXHIBITPATENT OWNER

Ex. 2116

Sep 19, 2017EXHIBITPATENT OWNER

Declaration of Jared Bobrow In Support of Petitioner's Motion for Admission Pro Hac Vice

Jul 11, 2017EXHIBITPETITIONER

Petitioner's Motion for Admission Pro Hac Vice of Jared Bobrow

Jul 11, 2017PAPERPETITIONER

EXPUNGED

Jun 19, 2017PAPERBOARD

Notice of Filing Date Accorded to Petition

Jun 19, 2017PAPERBOARD

IPR2017-01493 PO Mandatory Notice

Jun 16, 2017PAPERPATENT OWNER

IPR2017-01493 PO Power of Attorney

Jun 16, 2017PAPERPATENT OWNER

Petitioner's Updated Mandatory Notices

Jun 5, 2017PAPERPETITIONER

U.S. Patent No. 6,159,855

May 26, 2017EXHIBITPETITIONER

Leskela, M. and M. Ritala, ALD precursor chemistry: Evolution and future challenges

May 26, 2017EXHIBITPETITIONER

U.S. Patent No. 6,723,577

May 26, 2017EXHIBITPETITIONER

Petition

May 26, 2017PAPERPETITIONER

Power of attorney

May 26, 2017PAPERPETITIONER

U.S. Patent No. 6,969,539

May 26, 2017EXHIBITPETITIONER

Excerpts from Prosecution File History for U.S. Patent No. 6,969,539

May 26, 2017EXHIBITPETITIONER

Declaration of Dr. Sanjay Banerjee

May 26, 2017EXHIBITPETITIONER

Curriculum Vitae of Dr. Sanjay Banerjee

May 26, 2017EXHIBITPETITIONER

U.S. Patent No. 6,984,591

May 26, 2017EXHIBITPETITIONER

Dusco, C., et al., Deposition of Tin Oxide into Porous Silicon by Atomic Layer Epitaxy

May 26, 2017EXHIBITPETITIONER

Ott, A.W., et al., Modification of Porous Alumina Membranes Using Al2O3 Atomic Layer Controlled Deposition

May 26, 2017EXHIBITPETITIONER

Leskela, M. and M. Ritala, Atomic Layer Epitaxy in Deposition of Various Oxide and Nitride Thin Films

May 26, 2017EXHIBITPETITIONER

Ruff, J., The Preparation and Reactions of Dialkylamino Derivatives of Aluminum

May 26, 2017EXHIBITPETITIONER

Jones, K. and Lappert, M.F., Amino-derivatives of Metals and Metalloids

May 26, 2017EXHIBITPETITIONER

Bastianini, A., et al., Chemical Vapor Deposition

May 26, 2017EXHIBITPETITIONER

Viirola, H. and Niinisto, L., Controlled growth of tin dioxide thin films by atomic layer epitaxy

May 26, 2017EXHIBITPETITIONER

Min, J., et al., Atomic Layer Deposition of TiN Films

May 26, 2017EXHIBITPETITIONER

Bouman, M. and Zaera, F., Reductive Eliminations from Amido Metal Complexes

May 26, 2017EXHIBITPETITIONER

Harvard Complaint

May 26, 2017EXHIBITPETITIONER

Certified Translation of Korean Patent No. 0156980

May 26, 2017EXHIBITPETITIONER

U.S. Patent No. 5,178,911

May 26, 2017EXHIBITPETITIONER

U.S. Patent No.6,045,650

May 26, 2017EXHIBITPETITIONER

Declaration of Roy G. Gordon

May 26, 2017EXHIBITPETITIONER

U.S. Patent No. 7,507,848

May 26, 2017EXHIBITPETITIONER

U.S. Patent No. 8,334,016

May 26, 2017EXHIBITPETITIONER

Roy Gordon LinkedIn Profile

May 26, 2017EXHIBITPETITIONER

Markku Leskela LinkedIn Profile

May 26, 2017EXHIBITPETITIONER

Douglas Buchanan LinkedIn Profile

May 26, 2017EXHIBITPETITIONER

Brian Vaartstra LinkedIn Profile

May 26, 2017EXHIBITPETITIONER

Gates, S.M., Surface Chemistry in the Chemical Vapor

May 26, 2017EXHIBITPETITIONER

Excerpts from Prosecution File History of U.S. Patent No. 8,334,016

May 26, 2017EXHIBITPETITIONER

George, S.M. et al., Surface Chemistry for Atomic Layer Growth

May 26, 2017EXHIBITPETITIONER

Pierson, H., Principles, Technology, and Applications

May 26, 2017EXHIBITPETITIONER

Fix, R., et al., Chemical Vapor Deposition of Titanium

May 26, 2017EXHIBITPETITIONER

Smith, R., Chemical Vapour Deposition of the Oxides of Titanium

May 26, 2017EXHIBITPETITIONER

Brusasco, Raymond M., High Index of Refraction Films

May 26, 2017EXHIBITPETITIONER

U.S. Patent No. 5,252,518

May 26, 2017EXHIBITPETITIONER

Ritala, M. et al., Atomic Layer Deposition of Oxide Thin Films

May 26, 2017EXHIBITPETITIONER

Ritala, M., Advanced ALE processes of amorphous

May 26, 2017EXHIBITPETITIONER

Niinisto, L. et al., Synthesis of oxide thin films and overlayers

May 26, 2017EXHIBITPETITIONER

Declarations of Susanne J Redalje

May 26, 2017EXHIBITPETITIONER

Hampden-Smith, M.J. and Kodas, T.T., Chemical Vapor Deposition of Metals

May 26, 2017EXHIBITPETITIONER

Suntola, T., Atomic Layer Epitaxy

May 26, 2017EXHIBITPETITIONER

Bradley, D.C. and Thomas, I.M., Metallo-organic compounds

May 26, 2017EXHIBITPETITIONER

Suntola, T. and J. Hyvarinen, Atomic Layer Epitaxy

May 26, 2017EXHIBITPETITIONER

Ritala, M. et al., Perfectly Conformal TiN and Al2O3 Films

May 26, 2017EXHIBITPETITIONER

Solid State Technology, Insights for Electronics Manufacturing

May 26, 2017EXHIBITPETITIONER

Goodman, C. and Pessa, M.V., Atomic layer epitaxy

May 26, 2017EXHIBITPETITIONER

George, S. M., Atomic Layer Deposition

May 26, 2017EXHIBITPETITIONER

Ritala, M. and M. Leskela, Zirconium dioxide thin films deposited

May 26, 2017EXHIBITPETITIONER

Colombo, D. et al., Anhydrous Metal Nitrates as Volatile Single

May 26, 2017EXHIBITPETITIONER

Bradley, D.C. and Gitlitz, M.H., Metallo-organic Compounds

May 26, 2017EXHIBITPETITIONER

Lee, J.G. et al., Comparison of TiN films produced by TDEAT

May 26, 2017EXHIBITPETITIONER

ITRS Roadmap

May 26, 2017EXHIBITPETITIONER

Kytokivi, A. et al., Controlled Formation of ZrO2 in the Reaction

May 26, 2017EXHIBITPETITIONER

Declaration of Sharon Wiles-Young

May 26, 2017EXHIBITPETITIONER

Declaration of Sharon-Wiles-Young

May 26, 2017EXHIBITPETITIONER

T. W. Ryan et al., Ignition Delays, Heats Of Combustion

May 26, 2017EXHIBITPETITIONER

Declarations of Susanne J Redalje

May 26, 2017EXHIBITPETITIONER

Declaration of Sharon Wiles-Young

May 26, 2017EXHIBITPETITIONER

Declaration of Sharon Wiles-Young

May 26, 2017EXHIBITPETITIONER

European Patent Publication No. EP 0322155

May 26, 2017EXHIBITPETITIONER

Lide, D.R. et al., CRC Handbook of Chemistry and Physics

May 26, 2017EXHIBITPETITIONER

Roesky H.W., Preparation and Reactions of Sulfur-Nitrogen Ring

May 26, 2017EXHIBITPETITIONER