IP Verse

Taiwan Semiconductor Manufacturing Company Limited. vs Alidouble Inc.

The detailed information for PTAB case with proceeding number IPR2023-00373 filed by Taiwan Semiconductor Manufacturing Company Limited. against Alidouble Inc. on Dec 16, 2022. This includes filing dates, application numbers, tech centers, patent numbers, and current case status.

Case Details

Proceeding Number
IPR2023-00373
Filing Date
Dec 16, 2022
Petitioner
Taiwan Semiconductor Manufacturing Company Limited.
Respondent
Alidouble Inc.
Status
Terminated-Settled
Respondent Application Number
14536649
Respondent Tech Center
2800
Respondent Patent Number
9431455
Institution Decision Date
Jul 12, 2023
Termination Date
Jan 26, 2024

Proceeding Documents

The table below shows documents filed in the case, listing each document name, filing date, document type, and filing party. Tracking these filings indicates the activity of the parties involved in the case, and the types of documents filed can provide insights into the legal strategies being employed.


Document NameFiling DateCategoryFiling Party

Alert me when new update on this case

Termination Decision: Post-DI Settlement

Jan 26, 2024PAPERBOARD

Joint Motion to Terminate

Jan 18, 2024PAPERPETITIONER

Motion to Keep Confidential and Separate

Jan 18, 2024PAPERPETITIONER

Settlement Agreement

Jan 18, 2024EXHIBITPETITIONER

Stipulation to Extend Dates

Dec 11, 2023PAPERPETITIONER

Petitioner's Notice of Objections to Evidence

Oct 18, 2023PAPERPETITIONER

Patent Owner's Response

Oct 11, 2023PAPERPATENT OWNER

Declaration of Ron Maltiel

Oct 11, 2023EXHIBITPATENT OWNER

Curriculum Vitae, Ron Maltiel

Oct 11, 2023EXHIBITPATENT OWNER

Xiao, Chapter 10 - CVD and Dielectric Thin Film

Oct 11, 2023EXHIBITPATENT OWNER

Stefanov, Design and Performance of a Pinned Photodiode CMOS Image sensor (2018)

Oct 11, 2023EXHIBITPATENT OWNER

Plasma-Therm: PECVD and HDPCVD Basics (2015)

Oct 11, 2023EXHIBITPATENT OWNER

Wolf & Tauber, Silicon Processing for the VLSI Era, Volume 1: Process Technology

Oct 11, 2023EXHIBITPATENT OWNER

Patent Owner's Power of Attorney

Sep 6, 2023PAPERPATENT OWNER

Patent Owner's Updated Mandatory Notice

Sep 6, 2023PAPERPATENT OWNER

Decision Granting Institution of Inter Partes Review

Jul 12, 2023PAPERBOARD

Order: SCHEDULING ORDER

Jul 12, 2023PAPERBOARD

Patent Owner's Preliminary Response Under 37 C.F.R. § 42.107

Apr 19, 2023PAPERPATENT OWNER

Characteristics of SiOxNy films deposited by inductively coupled plasma enhanced chemical vapor deposition using HMDS/NH3/O2/Ar for water vapor diffusion barrier (September 2006)

Apr 19, 2023EXHIBITPATENT OWNER

SiOxNy thin film deposited by plasma enhanced chemical vapor deposition at low temperature using HMDS–O2–NH3–Ar gas mixtures (September 2006)

Apr 19, 2023EXHIBITPATENT OWNER

Formation of size-controlled silicon nanocrystals in plasma enhanced chemical vapor deposition grown SiOxNy/SiO2 superlattices (2011)

Apr 19, 2023EXHIBITPATENT OWNER

On the nitrogen and oxygen incorporation in plasma-enhanced chemical vapor deposition (PECVD) SiOxNy films (October 2001)

Apr 19, 2023EXHIBITPATENT OWNER

US Patent No. 3,849,204

Apr 19, 2023EXHIBITPATENT OWNER

OXIDATION OF SILICON (OXY)NITRIDE AND NITRIDATION OF SILICON DIOXIDE: MANIFESTATIONS OF THE SAME CHEMICAL REACTION SYSTEM? (1990)

Apr 19, 2023EXHIBITPATENT OWNER

Oxidation of silicon nitride films in an oxygen plasma (March 1999)

Apr 19, 2023EXHIBITPATENT OWNER

Physical and electrical characterisation of oxynitride films produced by plasma oxidation of deposited silicon nitride layers (1995)

Apr 19, 2023EXHIBITPATENT OWNER

Suppression of hydrogen-ion drift into underlying layers using plasma deposited silicon oxynitride film during high-density plasma chemical vapor deposition (November 2006)

Apr 19, 2023EXHIBITPATENT OWNER

Alidouble Inc., v. Taiwan Semiconductor Manufacturing Company Limited., Case No. 2:22-cv 00298-JRG (E.D. Tex), Docket Control Order.

Apr 19, 2023EXHIBITPATENT OWNER

Notice: Notice filing date accorded

Jan 20, 2023PAPERBOARD

Patent Owner's Mandatory Notice

Jan 4, 2023PAPERPATENT OWNER

Patent Owner's Power of Attorney

Jan 4, 2023PAPERPATENT OWNER

Petition : as filed

Dec 16, 2022PAPERPETITIONER

Notice : Power of Attorney

Dec 16, 2022PAPERPETITIONER

Ex. 1001. US9431455

Dec 16, 2022EXHIBITPETITIONER

Ex. 1002. US9431455 file history

Dec 16, 2022EXHIBITPETITIONER

Ex. 1003. Oshima (JP)

Dec 16, 2022EXHIBITPETITIONER

Ex. 1004. Oshima certificate

Dec 16, 2022EXHIBITPETITIONER

Ex. 1005. Oshima (EN)

Dec 16, 2022EXHIBITPETITIONER

Ex. 1006. Nagai - US7598557

Dec 16, 2022EXHIBITPETITIONER

Ex. 1007. Lee - US20090072282A1

Dec 16, 2022EXHIBITPETITIONER

Ex. 1008. Crook - US9165762

Dec 16, 2022EXHIBITPETITIONER

Ex. 1009. Miyazaki_EP1065714A1

Dec 16, 2022EXHIBITPETITIONER

Ex. 1010. Wang - US7803647

Dec 16, 2022EXHIBITPETITIONER

Ex. 1011. Omi - US7816749

Dec 16, 2022EXHIBITPETITIONER

Ex. 1012. Foggiato-CVD of Silicon Dioxide Films-2001

Dec 16, 2022EXHIBITPETITIONER

Ex. 1013. Wolf_I_p393-396

Dec 16, 2022EXHIBITPETITIONER

Ex. 1014. Wolf (Vol. 2) pp. 273-75, 318-19

Dec 16, 2022EXHIBITPETITIONER

Ex. 1015. Stojakovic_2000_JVST

Dec 16, 2022EXHIBITPETITIONER

Ex. 1016. White, A_low_voltage_SONOS_nonvolatile_semiconductor_memory_techn

Dec 16, 2022EXHIBITPETITIONER

Ex. 1017. Frank, Approaches For Patterning of Aluminum (1997)

Dec 16, 2022EXHIBITPETITIONER

Ex. 1018. Riley_1993_J._Electrochem._Soc._140_1518

Dec 16, 2022EXHIBITPETITIONER

Ex. 1019. Hwang, Modeling of Charging Damage During Interlevel Oxide Deposi

Dec 16, 2022EXHIBITPETITIONER

Ex. 1020. 455 Giapis Decl (FINAL)

Dec 16, 2022EXHIBITPETITIONER

Ex. 1021. Giapis_CV_10_2022_clean

Dec 16, 2022EXHIBITPETITIONER