Samsung Austin Semiconductor, LLC et al. vs Sung, Chien-Min

Other: Hearing transcript

Patent Owner's Demonstratives

Patent Owner's Objections to Petitioners' Demonstratives

Petitioner's Updated Exhibit List

EX1070 - Petitioner's Demonstratives

Patent Owner's Reply In Support Of Motion To Exclude

Petitioner's Opposition to PO's Motion to Exclude Evidence

Patent Owner's Motion to Exclude

Order: Joint Oral Argument

Patent Owner's Request for Oral Argument

Petitioner's Request for Oral Argument

Patent Owner's Sur-Reply to the Petition

Patent Owner’s Objections To Petitioners’ Reply Evidence Pursuant To 37 C.F.R. § 42.64(b)(1)

EX1044 - Marked up Dressing Characteristics of Oriented Single Diamond on CMP Polyurethane Pad

EX1045 - Marked up Effect of CMP conditioner diamond shape on pad topography and oxide wafer performances

EX1046 - Marked up Novel Diamond Conditioner Dressing Characteristics of CMP Polishing Pad

EX1047 - Deposition of Dr. Tsai in IPR2024-00533, Vol I

EX1048 - Deposition of Dr. Tsai in IPR2024-00533, Vol II

EX 1049 - Deposition of Dr. Tsai in IPR2024-00534

EX1050 - Single Diamond Dressing Characteristics of CMP Polyurethane Pad

EX1051 - PCD Pad Conditioners for Low Pressure Chemical Mechanical Planarisation of Semiconductors

EX1052 - Dressing Behaviors of PCD Conditioners on CMP Polishing Pads

EX1053 - Mosaic Diamond Pad Conditioners for Improved CMP Performance

EX1054 - The Black Pad with Graphite Impregnation for CMP

EX1055 - The CMP by Polishing with GiP Dressed by BODD

EX1056 - Organic diamond disk versus brazed diamond disk for dressing a chemical–mechanical polishing pad

EX1057 - Development of a novel cooling system-assisted minimum quantity lubrication method for improvement of milling performance

EX1058 - U.S. Patent Application Publication No. 2010/0248595 (“Dinh-Ngoc”)

EX1059 - U.S. Application No. 11/223,786

Petitioner Samsung's Reply iso of Its Petition

Email Communications Between Counsel and PTAB

Order: Conduct of Proceeding

Deposition Notice to Ming-Yi Tsai

Order Conduct of the Proceeding

Petitioner's Updated Mandatory Notices

Patent Owner Updated Mandatory Notices

Patent Owner's Response

Second Declaration of Dr. Ming-Yi Tsai

Patent Owner's Objections to Petitioner's Pre-Institution Evidence

Institution Decision: DECISION Granting Institution of Inter Partes Review 35 U.S.C. § 314

Order: SCHEDULING ORDER 37 C.F.R. § 42.5

Exhibt 3002 COMPLAINT FOR PATENT INFRINGEMENT

Exhibit 3004 COMPLAINT FOR PATENT INFRINGEMENT

Exhibit 3005 Court Statistics

Exhibit 3006 DEFENDANTS’ MOTION TO DISMISS OR, IN THE ALTERNATIVE, MOTION FOR A MORE DEFINITE STATEMENT

Exhibit 3007 STIPULATION OF DISMISSAL

Patent Owner's Sur-Reply to Petitioner's Reply to Patent Owner's Preliminary Response

EX1028

EX1029

EX1030

EX1031

EX1032

EX1033

EX1034

EX1035

EX1036

EX1037

EX1038

EX1039

EX1040

EX1041

EX1042

EX1043

Petitioner’s Preliminary Reply to Patent Owner’s Preliminary Response

Order: Conduct of the Proceeding

Exhibit 3001

Updated Mandatory Notice

Patent Owner's Preliminary Response

Declaration of Dr. Ming-Yi Tsai

M. Y. Tsai & Y. S. Liao (2009) Dressing Characteristics of Oriented Single Diamond on CMP Polyurethane Pad, Machining Science and Technology, 13:1, 92-105

M. Y. Tsai et al., Novel Diamond Conditioner Dressing Characteristics of CMP Polishing Pad, International Journal of Machine Tools & Manufacture 49 (2009) 722–729

Kuen-Ren Chen & Hong-Tsu Young, Estimation of Dressing Effects in Chemical Mechanical Polishing with Sorts of Diamond Dressers, Advanced Materials Research Online: 2009-06-24 ISSN: 1662-8985, Vols. 76-78, pp 175-180

Hsiu-Ming Yeh & Kuo-Shen Chen, Development of a pad conditioning simulation module with a diamond dresser for CMP applications, Int J Adv Manuf Technol (2010) 50:1–12

Statistics on stay motions relating to Inter Partes review proceedings in the Eastern District of Texas compiled from Docket Navigator

NOTICE OF FILING DATE ACCORDED TO PETITION AND TIME FOR FILING PATENT OWNER PRELIMINARY RESPONSE

Notice : Mandatory Notice

Notice : Power of Attorney

EX1001 - U.S. Patent No. 9,138,862

EX1002 - Expert Decl.

EX1003 - '862 Patent FH (Vol 1)

EX1003 - '862 Patent FH (Vol 2)

EX1003 - '862 Patent FH (Vol 3)

EX1004 - U.S. Patent App. Pub. No. 2007/0060026 (“Sung’026”)

EX1005 - “The Organic Diamond Disk (ODD) for dressing of Polishing Pads

EX1006 - U.S. Patent App. Pub. No. 2008/0087644 (“Nishioka”)

EX1007 - WO 2008/049019 (“Lin”)

EX1008 - U.S. Patent App. Pub. No. 2009/0001581 (“Kim”)

EX1009 - U.S. Patent App. Pub. No. 2009/0117692 (“Koyama”)

EX1010 - U.S. Patent No. 5,036,015

EX1011 - Ishizuka et al.

EX1012 - U.S. Patent App. Pub. No. 2008/0292869 (Sung’869)

EX1013 - Fenna, A Dictionary of Weights, Measures, and Units

EX1014 - Tsai et al., “Effect of CMP conditioner diamond shape

EX1015 - Pysher et al.

EX1016 - Design, Characteristics and Performance of Diamond Pad Conditioner

EX1017 - Exhibit 4 of Complaint in Sung v. Samsung et al, 4-23-cv-00752

EX1018 - Scheduling Order in Sung v. Samsung et al, 4-23-cv-00752

EX1019 - Electronic Copy of SungICPT

EX1020 - Records for Proceedings ICPT 2007

EX1021 - TIB records for Proceedings ICPT 2007

EX1022 - Program and Invitation, ICPT

EX1023 - ICPT 2007 Conference Registration website

EX1024 - ICPT 2007 Program order form webpage

EX1025 - Online catalog of the German National Library

EX1026 - GetInfo Portal of the German National Library of Science & Tech.

EX1027 - Hsieh-Yee Decl.

Notice : Power of Attorney of Samsung Austin Semiconductor, LLC

Notice : Power of Attorney of Samsung Electronics America, Inc.

Notice : Power of Attorney of Samsung Electronics Co., Ltd.

Notice : Power of Attorney of Samsung Semiconductor, Inc.

Petition for Inter Partes Review of 862 Patent : as filed